​​​​​​​​

 

PTInternational LLC  Semiconductor Training
A SEMI U Training Partner!

Occurrence and Essential Importance of PFAS Compounds Used in Semiconductor Materials Processing 


 

Occurrence and Essential Importance of PFAS Compounds Used in Semiconductor Materials Processing 

 Introduction and Terminology (30 minutes) 1.1. Introduction – what are PFAS compounds and what are the issues with their use?

1.2. Definitions by various regulatory agencies 1.3. The problems with certain PFAS: bioaccumulation, biopersistence, and toxicity 1.4. Common terminology used throughout the course 1.5. Questions?

2. Fluorine Chemistry Fundamentals Related to PFAS Compounds (30 minutes) 2.1. What makes PFAS compounds unique? – chemical and physical properties 2.2. Classes of PFAS based on structure 2.3. Questions?

PART B: Major uses of PFAS in semiconductor materials manufacturing 3. Fluorine Compounds used in Photolithography (90 minutes) 3.1. Photoacid Generators (PAGs) – ionic and non-ionic - photochemistry 3.2. Photoresists: perfluoroalkyl compounds providing unique properties and functionality (fluoroalcohols, fluoroacrylates, and fluorotelomers) 3.3. Fluorinated high-temperature polymers: polyimides and polybenzoxazoles 3.4. Anti-reflective coatings (BARC and TARC) 3.5. Fluorinated top coats 3.6. Fluorinated surfactants and surface leveling agents 3.7. The Prospect for alternatives to PFAS in photolithography 3.8. Questions?

4. Fluorine Compounds used in plasma etching, thin-film deposition, and chamber cleaning (90 minutes) 4.1. Plasma etching – utility of fluorochemicals used for reactive-ion etching 4.2. Thin-film deposition – fluorinated ligands, compounds, and complexes 4.3. Chamber cleaning – fluorochemical compounds used 4.4. Alternatives to PFAS for plasma etching 4.5. Alternatives to PFAS for chamber cleaning (NF3 and F2) 4.6. Questions?

5. Fluorine Compounds used in wet chemical processing (60 minutes) 5.1. Aqueous wet etching chemistry – etchants and surfactants 5.2. Aqueous wet cleaning chemistry – active reagents and surfactants 5.3. CMP and post-CMP cleaning – active agents and surfactants 5.4. Alternatives to PFAS compounds for wet chemical processing 5.5. Questions?

6. PFAS Compounds used in heat transfer, vacuum, and lubricant applications (30

minutes)

6.1. Perfluorinated heat transfer fluids 6.2. Refrigeration 6.3. Vacuum pump oils 6.4. Lubricants 6.5. Alternatives 6.6. Questions?7. Miscellaneous use of PFAS (30 minutes) 7.1. Assembly, testing, and packaging applications 7.2. Semiconductor manufacturing and related equipment (SMRE) and infrastructure  paragraph here.

G-D2QHZFV7L9