Fundamentals of Ion Implantation and RTP

Professional semiconductor training with 46+ years of industry expertise

Course Overview

This 1-day course covers Ion Implantation processing as it relates to semiconductor processing. Students will learn the fundamentals of ion beam technology, process applications, system architecture, and operational principles essential for semiconductor device fabrication.

What the Course Covers

  • Ion Beam fundamentals
  • Ion implantation process applications
  • Terminology
  • Basic ion implantation system architecture
  • Principles of operation
  • Implant issues
  • Contamination issues and control
  • Safety Issues

Course Topics

Ion Beam Fundamentals

  • Ion beam generation and control
  • Ion source technology and operation
  • Beam transport and focusing systems
  • Energy and dose control mechanisms

System Architecture and Operation

  • Basic ion implantation system components
  • System architecture and design principles
  • Principles of operation and process control
  • Equipment maintenance and troubleshooting

Process Applications and Issues

  • Ion implantation process applications in semiconductor manufacturing
  • Common implant issues and solutions
  • Contamination sources, effects, and control methods
  • Safety considerations and protocols

Who Should Attend

Equipment engineers, R&M techs, tool designers, tool marketing and sales personnel involved in ion implantation systems and semiconductor processing.

Prerequisites

Basic understanding of semiconductor manufacturing processes is recommended.

Ready to Register?

$8,900 USD

For up to 14 students (1 Day)

Register Now
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Duration
1 Day
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Format
On-site Training

Need More Information?

Have questions about this course or need a custom training solution?

Phone: 636-343-1333

Email: heather@pti-inc.com