Professional semiconductor training with 46+ years of industry expertise
The purpose of this course is to teach attendees what a plasma is and does, what it is used for, and how plasma parameters can influence the outcomes of etch, CVD, and PVD processes. It provides the essential vocabulary and basic understanding of RF plasma required to navigate modern semiconductor manufacturing operations.
This course is highly recommended for operators, process managers, engineers, technicians, plant managers, and supply-chain managers who require a working understanding and common vocabulary of RF plasma systems.
Attendees should have a good, working knowledge of vacuum systems for process tools before taking this course.
This is a one-day class (up to 20 attendees) consisting mostly of detailed lectures, complemented by a 45-60 minute hands-on lab that will draw three volunteers from the class for practical demonstration.
Learn directly from industry veterans with 20+ years of hands-on experience in specialized plasma topics and advanced semiconductor technology.