Course Overview
Target Audience: Operators, process managers, engineers and technicians, plant managers and supply-chain managers that need a basic understanding and common vocabulary of RF plasma.
Prerequisite: Good and working knowledge of vacuum systems for process tools
Class Size: Up to 20 attendees
Class Goal: To teach the audience what a plasma is and does, what it is used for, and how the plasma parameters can influence the outcomes of etch, CVD, and PVD processes.
Format: Class is one day with mostly lecture and a 45-60-minute hands-on lab which will draw three volunteers from the class.
What You'll Learn
- Learning objectives not found
Course Modules
Course Content
- Plasma Physics and Chemistry Semiconductor Training A SEMI U Training Partner! Plasma Physics and Chemistry – One day Target Audience – operators, process managers, engineers and technicians, plant managers and supply-chain managers that need a basic understanding and common vocabulary of RF plasma. Prerequisite – Good and working knowledge of vacuum systems for process tools Class Size – up to 20 attendees Class Goal – To teach the audience what a plasma is and does, what it is used for, and how the plasma parameters can influence the outcomes of etch, CVD, and PVD processes. Class is one day with mostly lecture and a 45-60-minute hands-on lab which will draw three volunteers from the class.
Prerequisites
- – good and working knowledge of vacuum systems for process toolsclass size – up to 20 attendeesclass goal – to teach the audience what a plasma is and does, what it is used for, and how the plasma pa
Who Should Attend
- Managers
- Engineers
- Technicians
Expert Instructors
Industry veterans with 20+ years of experience in specialized topics and semiconductor technology.
What You'll Learn
- Plasma physics fundamentals
- Reactive ion etching (RIE) processes
- Atomic layer etching (ALE) techniques
- Process optimization and control
- Equipment design and operation
- Safety and troubleshooting procedures