Professional semiconductor training with 46+ years of industry expertise
The goal of this course is to teach the audience how RF energy is used to create a plasma, how RF power is generated and transmitted through system components into the plasma chamber, and how the energy is ultimately coupled to the plasma. We place a heavy emphasis on how RF parameters can influence the plasma properties that determine process results, proper grounding and shielding, and how to effectively troubleshoot common RF problems.
This course is designed for process engineers, process technicians, equipment engineers, and equipment technicians who work directly with RF power delivery systems in plasma applications.
Attendees are required to have completed the Plasma Physics and Chemistry Course (or possess equivalent working knowledge) prior to enrolling in this class.
This is a densely packed two-day class (limited to up to 14 attendees). The curriculum features comprehensive lectures, several short hands-on lab exercises, and a robust two-hour lab session toward the end of the second day. During this session, everyone is expected to actively participate in taking measurements, running RF scenarios, and troubleshooting issues to demonstrate the concepts taught.
Learn directly from industry veterans with 20+ years of hands-on experience in specialized semiconductor topics and RF power technology.