Course Overview
XPS is used to determine the atoms present at a surface and their concentrations, chemistry, and lateral and depth distributions. This is a 2-day course.
What the Course Covers
Introduction and Fundamentals
- Terminology, Surfaces, Types of Surfaces
- The principles of XPS
- Production of Photoelectrons, Peak Labeling
- Electronic Configuration of Atoms, Atoms, Molecules, Solids
- Energy, Spectra, Auger Process
- Valence Spectra, Surface Sensitivity, Information Depth
- Sample Handling
Spectral Features and Analysis
- Spin-Orbit Splitting
- Chemical Shift
- Plasmons
- Multiplet Splitting
- Shake-up
Instrumentation
- Dual Anode
- Bremsstrahlung
- Monochromatic Source
- Electron Energy Analyzers
- Spectrum Acquisition
- Energy Resolution
- Scattering in Analyzers
- Electron Detectors
- Pulse Counting
- Position Sensitive Detectors
Small Area Analysis and Imaging
- Small Area Analysis
- Area Location
- Imaging XPS
- Methods, Equipment and Examples
- Vacuum System Samples
Qualitative Analysis
- Energy Scale Calibration
- Identification of Elements
- Changing X-Ray sources
- Charging
- Interpretation of Chemical Shift
- Relaxation Effects
- Auger Parameter
- Peak Widths, Lineshapes
Quantitative Analysis
- Sensitivity Factors
- Ionization Cross Section
- Asymmetry Parameter
- Analyzer Transmission
- Reference Spectra
- Intensities
- Background Subtraction
- Detection Limit
- Effect of Thin Overlayers
Artifacts and Data Processing
- X-Ray Damage
- Charging, Methods for Charge Control
- Ghost Peaks
- Data Acquisition and Processing
- Processing Data
- Tougaard Background Subtraction
- Satellite Subtraction
- Peak Area, Lineshapes
- Curve Fitting, Deconvolution
- Depth Profiling
Who Should Attend
Scientists, Engineers, Technicians, and Students who would like a detailed understanding of the use of x-ray photoelectron spectroscopy (XPS/ESCA) for surface analysis.