Atomic Layer Deposition (ALD) Course Outline
I. Introduction to Atomic Layer Deposition (ALD) A. Definition of ALD
B. Purpose of ALD in Semiconductor Manufacturing
II. ALD Tool Architecture
A. Types of ALD Tools
B. Overview of Tool Components and Operation
III. Gases Used in ALD
A. Types of ALD Precursor Gases
B. Properties of ALD Precursor Gases
C. Gas Delivery Systems and Flow Control
IV. Operation of ALD
A. Overview of ALD Process Flow
B. Steps Involved in ALD Process
C. Key Considerations and Best Practices
V. Control of ALD
A. Overview of ALD Process Parameters
B. Control Techniques for ALD Process Stability and Repeatability
VI. Applications of ALD in Semiconductor Manufacturing
A. ALD for Film Deposition
B. ALD for Device Fabrication
C. ALD for Advanced Packaging
VII. Process Issues and Defects in ALD
A. Common ALD Process Issues
B. Defects Caused by ALD
C. Strategies for Defect Prevention and Mitigation
VIII. ALD Tool Makers
A. Major ALD Tool Providers
B. Comparison of ALD Tool Technologies
IX. Future Advancements in ALD
A. Emerging ALD Technologies and Trends B. Potential Applications of ALD in Semiconductor Manufacturing
Target Audience:
This course is designed for process engineers, technicians, and production personnel involved in semiconductor manufacturing.
Learning Outcomes: By the end of this course, participants should have a solid understanding of the following:
The fundamentals of atomic layer deposition (ALD) and its importance in semiconductor manufacturing
The architecture and operation of ALD tools
The gases used in ALD and their properties
The operation and control of the ALD process
The various applications of ALD in semiconductor manufacturing
Common process issues and defects caused by ALD and strategies for prevention and mitigation
The major ALD tool providers and comparison of ALD tool technologies
Emerging ALD technologies and trends in semiconductor manufacturing.
Schedule: We only offer this course on-site
Price: $10900 USD for the first 20 attendees